Layer deposition techniques have emerged as indispensable methods for constructing ultrathin films with precise control over thickness, composition and microstructure. Methods such as atomic layer ...

Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...

The laser wavelength, pulse duration, and fluence (energy density) significantly influence the ablation process and the resulting plasma plume. Shorter wavelengths and higher fluences generally lead ...

PVD techniques, such as sputtering and thermal evaporation, involve the physical vaporization of a target material and its subsequent condensation onto a substrate to form a thin film. PVD methods ...

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...

Discover how KDF is balancing legacy expertise with forward-looking innovation to shape the future of thin-film deposition. KDF has been a trusted name in thin-film deposition for decades. How would ...

Kalpana Systems, a Dutch equipment manufacturer, is launching spatial atomic layer deposition (sALD) tools to be used in roll-to-roll manufacturing processes in the solar PV, organic light emitting ...